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ASTM F2113-01(2011)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film ApplicationsMore info
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.
1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Rationale:
| Author | ASTM |
|---|---|
| Editor | ASTM |
| Document type | Standard |
| Format | File |
| Confirmation date | 2011-06-01 |
| ICS | 29.045 : Semiconducting materials |
| Number of pages | 2 |
| Replace | ASTM F2113-01(2007) |
| Set | ASTMVOL1004 |
| Year | 2001 |
| Document history | |
| Country | USA |
| Keyword | ASTM 2113;ASTM F2113;ASTM F2113;10.1520/F2113-01R11 |