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ASTM E986-04(2017)

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ASTM E986-04(2017)

Standard Practice for Scanning Electron Microscope Beam Size Characterization

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1.1 This practice provides a reproducible means by which one aspect of the performance of a scanning electron microscope (SEM) may be characterized. The resolution of an SEM depends on many factors, some of which are electron beam voltage and current, lens aberrations, contrast in the specimen, and operator-instrument-material interaction. However, the resolution for any set of conditions is limited by the size of the electron beam. This size can be quantified through the measurement of an effective apparent edge sharpness for a number of materials, two of which are suggested. This practice requires an SEM with the capability to perform line-scan traces, for example, Y-deflection waveform generation, for the suggested materials. The range of SEM magnification at which this practice is of utility is from 1000 to 50 000 × . Higher magnifications may be attempted, but difficulty in making precise measurements can be expected.

Author ASTM
Editor ASTM
Document type Standard
Format File
Confirmation date 2017-06-01
ICS 31.120 : Electronic display devices
37.020 : Optical equipment
Number of pages 3
Replace ASTM E986-04(2010)
Set ASTMVOL0301
Year 2004
Document history ASTM E986-04(2010)
Country USA
Keyword ASTM 986;ASTM E986;ASTM E986;10.1520/E0986-04R17